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BGB201 Specifications

Detailed technical information and Application Scenarios

Product Details

PartNumberManufactorQuantityAvailability
BGB201PHI3000Yes

BGB201 Manufacturer PHI Specifications:** - **Manufacturer:** PHI (Physical Electronics) - **Model:** BGB201 - **Type:** Ion Gun (for surface analysis applications) - **Energy Range:** Typically adjustable (specific range depends on configurati

BGB201 Manufacturer PHI Specifications:

  • Manufacturer: PHI (Physical Electronics)
  • Model: BGB201
  • Type: Ion Gun (for surface analysis applications)
  • Energy Range: Typically adjustable (specific range depends on configuration)
  • Beam Current: Adjustable, optimized for sputtering and depth profiling
  • Beam Diameter: Variable, with focusing capabilities for precise analysis
  • Ion Species: Commonly supports Ar⁺, O₂⁺, Cs⁺, or other gases depending on configuration
  • Voltage Range: Adjustable (specific range varies by system setup)

Descriptions and Features:

  • Designed for use in surface analysis instruments such as XPS (XPS), SIMS, or AES systems.
  • Provides controlled ion beam sputtering for depth profiling and surface cleaning.
  • Compatible with ultra-high vacuum (UHV) environments.
  • Features precise beam alignment and focusing for accurate material removal.
  • Often integrated with PHI’s surface analysis systems for enhanced performance.
  • May include rastering capabilities for uniform sputtering over larger areas.

(Note: Exact specifications may vary based on system configuration and application requirements.)

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